National Aeronautics and Space Administration

Glenn Research Center

Pulsed Laser Deposition Laboratory

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Description

The pulsed laser deposition system offers unique capability to apply multiple layers of thin films of different compositions. The system is ideal for applying multi-layer, engineered coatings and provides a useful tool for quick screening of advanced material concepts.

Features

  • A turn-key pulsed laser deposition system with 20” turbo-pumped vacuum chamber.
  • Lambda-Physik Compex 301 KrF excimer laser operating at 248 nm; beam energy capability up to 1.2 J with a pulse rate of 1 to 50 shots/sec.
  • Beam delivery system that includes an adjustable lens and mirrors to adjust beam path.
  • Large area chamber with capability to deposit thin films and multi-layers uniformly over 2″ wafers at substrate temperatures from 25 to 950 °C.
  • The target carousel with capability to hold 6 targets, with computer control for depositing multilayer films using different materials.
  • Metered background gas for process pressure control.

Research Projects

  • Aeronautics/Integrated Vehicle Health Management (IVHM) and Hypersonics/Power harvesting using thermoelectric and piezoceramic materials for integrated sensors
  • Science/Radioisotope Power System (RPS)/Sublimation barrier coatings for advanced thermoelectric materials, nanostructured thermoelectric materials for increasing conversion efficiency

Potential Uses

  • Development of multifunctional material system with individual layers of a multilayer system representing different functionality
  • Rapid screening of complex material chemistries
  • Identifying material combinations for a given application

Point of Contact: Fred Dynys, 216-433-2404