National Aeronautics and Space Administration

Glenn Research Center

Pulsed Laser Deposition Laboratory



The pulsed laser deposition system offers unique capability to apply multiple layers of thin films of different compositions. The system is ideal for applying multi-layer, engineered coatings and provides a useful tool for quick screening of advanced material concepts.


  • A turn-key pulsed laser deposition system with 20” turbo-pumped vacuum chamber.
  • Lambda-Physik Compex 301 KrF excimer laser operating at 248 nm; beam energy capability up to 1.2 J with a pulse rate of 1 to 50 shots/sec.
  • Beam delivery system that includes an adjustable lens and mirrors to adjust beam path.
  • Large area chamber with capability to deposit thin films and multi-layers uniformly over 2″ wafers at substrate temperatures from 25 to 950 °C.
  • The target carousel with capability to hold 6 targets, with computer control for depositing multilayer films using different materials.
  • Metered background gas for process pressure control.

Research Projects

  • Aeronautics/Integrated Vehicle Health Management (IVHM) and Hypersonics/Power harvesting using thermoelectric and piezoceramic materials for integrated sensors
  • Science/Radioisotope Power System (RPS)/Sublimation barrier coatings for advanced thermoelectric materials, nanostructured thermoelectric materials for increasing conversion efficiency

Potential Uses

  • Development of multifunctional material system with individual layers of a multilayer system representing different functionality
  • Rapid screening of complex material chemistries
  • Identifying material combinations for a given application

Point of Contact: Fred Dynys, 216-433-2404